Development and Construction of Extreme Ultraviolet (EUV) Related Facilities for the Manufacturing of Next Generation of DRAM, the 1-Gamma (1γ) Node in Japan
Advising Micron Memory Japan, K.K. on the development and construction of EUV-related facilities for the manufacturing of its next generation Dynamic Random Access Memory (DRAM), the 1-gamma (1γ) node in Hiroshima, Japan, including advising, drafting and negotiating the Design Agreement, Engineering, Procurement and Construction Agreement for CSA works, Engineering and Construction Management Agreement for MEP works, Cost Plus Fee Agreement in respect of the management of direct contractors for MEP works).
Advising the client are Partner Dzuhairi bin Jaafar Thani and Senior Associate Tee Zhi Lun.
